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VACUUM

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期刊基本信息

期刊名称:VACUUM

出版国家或地区:ENGLAND

是否OA:No

期刊ISSN:0042-207X

期刊官方网站:http://www.journals.elsevier.com/vacuum/

期刊投稿网址:http://www.evise.com/evise/faces/pages/navigation/NavController.jspx?JRNL_ACR=VAC

通讯方式:PERGAMON-ELSEVIER SCIENCE LTD, THE BOULEVARD, LANGFORD LANE, KIDLINGTON, OXFORD, ENGLAND, OX5 1GB

涉及的研究方向:工程技术-材料科学:综合

出版周期:Monthly

出版年份:1951

期刊数据表:

最新中科院JCR分区
大类(学科)
小类(学科)
JCR学科排名
物理
MATERIALS SCIENCE, MULTIDISCIPLINARY(材料科学,跨学科) 3区 PHYSICS, APPLIED(物理学,应用) 3区
140/285 61/146
最新的影响因子
2.906
最新公布的期刊年发文量
年度总发文量 年度论文发表量 年度综述发表量
493 493 0
总被引频次 8923
特征因子 0.008400

VACUUM英文简介:

Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences.A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below.The scope of the journal includes:1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes).2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis.3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification.4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.The aim of the short communications is to enable researchers to rapidly share their most exciting work with their colleagues. The expected time from submission to final decision is approximately 6.4 weeks.

VACUUM中文简介:

《真空》是一份国际性的快速出版期刊,专注于短时间的交流。所有的论文都是同行评审的,评审过程是面向快速周转时间的简短沟通。该杂志还发表了完整的研究论文、专题论文和一些重要会议的精选论文。一份真空报告应代表一个领域的重大进展,该领域涉及一个大气压或以下的受控环境。期刊的范围包括:1. 真空;在真空抽真空和仪器仪表、真空测量、真空气体动力学、气体表面相互作用、特高压应用的表面处理和低放气、真空熔炼、烧结和真空计量方面的最初发展。大型设施(如粒子加速器和聚变装置)的技术和解决方案。新仪器(如探测器和电子显微镜)。2. 等离子体科学;PVD、CVD、等离子辅助CVD、离子源、沉积过程及分析等方面的研究进展。3.表面科学;表面工程,表面化学,表面分析,晶体生长,离子-表面相互作用和蚀刻,纳米尺度处理,表面改性。4. 材料科学;新颖的功能或结构材料。金属、陶瓷和聚合物。用于理解结构-属性关系的实验、模拟和建模。薄膜和涂料。纳米结构和离子注入。简短交流的目的是让研究人员能够快速地与同事分享他们最令人兴奋的工作。从提交到最终决定的预期时间约为6.4周。

历年影响因子

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